| 場發射式電子顯微鏡用高解析鍍金機 |
| ■ High Resolution Sputter Coater ■ |
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Illustrated：
sputter coater 208HR with
rotary-planetary-tilt stage
thickness controller MTM-20 |
Features：
※ Wide Choice of Coating Materials：
Magnetron head design and effective gas
handling allow a wide choice of
targetmaterials (see specification)
※ Precision Thickness Control：
Thickness optimized to the FE-SEM
operating voltage using the MTM-20
highresolution thickness controller
※ Multiple Sample Stage Movements：
Separate rotary, planetary and tilting
movements allow optimized coating
distributionand coverage. (view Rotary-Planetary-Tilt Stage )
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※ Variable Chamber Geometry：
Chamber geometry is used to adjust
deposition rates from 1.0 nm/sec
to 0.002nm/sec to optimize structure
※ Wide Range of Operating Pressures：
Independent power/pressure adjustment
allows operation at argon gas
pressureranges of 0.2 - 0.005 mbar
※ Compact Modern Benchtop Design：
Space and energy saving design
eliminates need for floor space, water,
specializedelectrical connections |
| Coating Difficult Samples for the FE-SEM |
The Cressington 208HR now offers real solutions to the problems encountered when coating difficult samples for FE-SEM. In order to minimize the effects of grain size the 208HR offers a full range of coating materials and gives unprecedented control over thickness and deposition conditions. To minimize charging effects the 208HR stage design and wide range of operating pressures allows precise control of the uniformity and conformity of the coating. The HIGH/LOW chamber configuration allows easy adjustment of working distance.
(Compare this picture with the top picture.) |
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| Rotary-Planetary-Tilt Stage |
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